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Room temperature gas-solid reaction of titanium on glass surfaces forming a very low resistivity layer

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dc.creatorSolís Sánchez, Hugo
dc.creatorClark Binns, Neville
dc.creatorAzofeifa Alvarado, Daniel E.
dc.creatorAvendaño Soto, Esteban
dc.date.accessioned2018-04-03T18:29:17Z
dc.date.available2018-04-03T18:29:17Z
dc.date.issued2016-09
dc.description.abstractTitanium films were deposited on quartz, glass, polyamide and PET substrates in a high vacuum system at room temperature and their electrical resistance monitored in vacuo as a function of thickness. These measurements indicate that a low electrical resistance layer is formed in a gas-solid reaction during the condensation of the initial layers of Ti on glass and quartz substrates. Layers begin to show relative low electrical resistance at around 21 nm for glass and 9nm for quartz. Samples deposited on polyamide and PET do not show this low resistance feature.es_ES
dc.description.procedenceUCR::Vicerrectoría de Investigación::Unidades de Investigación::Ciencias Básicas::Centro de Investigación en Ciencia e Ingeniería de Materiales (CICIMA)es_ES
dc.identifier.citationhttps://aip.scitation.org/doi/10.1063/1.4963679
dc.identifier.doi10.1063/1.4963679
dc.identifier.issn2158-3226
dc.identifier.urihttps://hdl.handle.net/10669/74408
dc.language.isoen_USes_ES
dc.rightsacceso abierto
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/*
dc.sourceAIP Advances, Vol. 6, Núm. 9, 2016es_ES
dc.subjectElectrical resistivityes_ES
dc.subjectQuartzes_ES
dc.subjectTitaniumes_ES
dc.subjectMetallic thin filmses_ES
dc.subjectThin film growthes_ES
dc.titleRoom temperature gas-solid reaction of titanium on glass surfaces forming a very low resistivity layeres_ES
dc.typeartículo original

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